However, we are not able to explain why smaller holes (e.g., sub-100-nm diameter) cannot be filled, for which we suggested a few possible factors for its explanation. Authors’ information CC received his masters degree from the University of Waterloo in 2011 and is now continuing his PhD study at the same institute. BC is an Assistant Professor at the Department

of Electrical and Computer Engineering, University Saracatinib datasheet of Waterloo. Acknowledgements The authors want to thank Hamed Shahsavan for his help with contact angle measurement, Xiaogan Liang from the University of Michigan, and Tom Glawdel from the University of Waterloo for their helpful discussions. CC acknowledges The Ministry of Turkish National Education for financially supporting his study. This work was carried out using the nanofabrication facility at Quantum NanoFab funded by the Canada Foundation for Innovation, the Ontario Ministry of Research & Innovation, and Ministry of Industry,

Tanespimycin Canada. References 1. Con C, Zhang J, Jahed Z, Tsui TT, Yavuz M, Cui B: Thermal nanoimprint lithography using fluoropolymer mold. Microelectron Eng 2012, 98:246–249.CrossRef 2. Khang DY, Lee HH: Sub-100 nm patterning with an amorphous fluoropolymer mold. Langmuir 2004, 20:2445.CrossRef 3. Cattoni A, Chen J, Decanini D, Shi J, Haghiri-Gosnet A-M: Soft UV nanoimprint lithography: a versatile tool for nanostructuration at the 20nm scale. In Recent Advances in Nanofabrication Techniques and Applications. Edited by: Cui B. Rijeka, Croatia: Intech; 2011:139–156. 4. Koo N, Bender M, Plachetka U, Fuchs A, Wahlbrink T, Bolten J, Kurz H: Improved mold fabrication for the definition of high quality nanopatterns by soft UV-nanoimprint lithography using diluted PDMS material. Microelectron Eng 2007, 84:904.CrossRef 5. Koo N, Plachetka U, Otto M, Bolten J, Jeong J, Lee E, Kurz H: The fabrication of a flexible mold for MycoClean Mycoplasma Removal Kit high resolution soft ultraviolet nanoimprint lithography. Nanotechnol 2008, 19:225304.CrossRef 6. Ting

Y, Shy S: Fabrication nano-pillars pattern on PDMS using anodic aluminum oxide film as template. Proc of SPIE 2012, 8323:83232H.CrossRef 7. Zhou W, Zhang J, Li X, Liu Y, Min G, Song Z, Zhang J: Replication of mold for UV-nanoimprint lithography using AAO membrane. Appl Surf Sci 2009, 255:8019.CrossRef 8. Zhou W, Niu X, Min G, Song Z, Zhang J, Liu Y, Li X, Zhang J, Feng S: Porous alumina nano-membranes: soft replica molding for large area UV-nanoimprint lithography. Microelectron Eng 2009, 86:2375.CrossRef 9. Byun I, Park J, Kim J, Kim B: Fabrication of PDMS nano-stamp by replicating Si nano-moulds fabricated by interference lithography. Key Eng Mat 2012, 516:25–29.CrossRef 10. Khorasaninejad M, Walia J, Saini S: Enhanced first-order Raman scattering from arrays of vertical silicon nanowires. Nanotechnol 2012, 23:275706.CrossRef 11.