Adv Mater Res 2010, 123:181–184.CrossRef 2. Korosec RC, Bukovec P: Sol–gel prepared NiO thin films for electrochromic applications. Acta Chim Slov 2006, 53:136–147. 3. Chan IM, Hong FC: Improved performance of the single-layer and double-layer organic light emitting diodes by nickel oxide coated indium tin oxide anode. Thin Solid Films 2004, 450:304–311.CrossRef 4. Hotovy I, Huran J, Siciliano P, Capone
S, Spiess L, Rehacek V: Enhancement of H 2 sensing properties of NiO-based thin films with a Pt surface modification. Sens Actuator B-Chem 2004, 103:300–311.CrossRef 5. Reguig BA, Khelil A, Cattin L, Morsli M, Bernède JC: Properties of NiO #BIBW2992 chemical structure randurls[1|1|,|CHEM1|]# thin films deposited by intermittent spray pyrolysis process. Appl Surf Sci 2007, 253:4330–4334.CrossRef 6. Sato H, Minami T, Takata S, Yamada T: Transparent conducting p-type NiO thin films prepared by magnetron sputtering. Thin Solid Films 1993, 236:27–31.CrossRef 7. Hasan AJ, Mohammad-Mehdi BM, Mehrdad SS: Nickel–lithium oxide alloy transparent conducting films deposited by spray pyrolysis technique. J Alloy Comp 2011,
509:2770–2773.CrossRef 8. Joseph DP, Saravanan M, Muthuraaman B, Renugambal P, Sambasivam S, Raja SP, Maruthamuthu P, Venkateswaran C: Spray deposition and characterization of nanostructured Li doped NiO thin films for application in dye-sensitized solar cells. Nanotechnology LXH254 datasheet 2008, 19:485707.CrossRef 9. Ohta H, Kamiya M, Kamiya T, Hirano M, Hosono H: UV-detector based on pn-heterojunction diode composed of transparent oxide semiconductors, p-NiO/n-ZnO. Thin Solid Films 2003, 445:317–321.CrossRef Methamphetamine 10. Mattheiss LF: Electronic structure of the 3D transition-metal monoxides. I. Energy-band results. Phys Rev 1972, B5:209. 11. Chen X, Zhao L, Niu Q: Electrical and optical properties of p-type Li, Cu-codoped NiO thin films. J Electro Mater 2012, 41:3382–3386.CrossRef 12. Jang WL, Lu YM, Hwang WS,
Chen WC: Electrical properties of Li-doped NiO films. J Eur Ceram Soc 2010, 30:503–508.CrossRef 13. Yu GH, Zhu FW, Chai CL: X-ray photoelectron spectroscopy study of magnetic films. Appl Phys A 2003, 76:45–47.CrossRef 14. Oswald S, Bruckner W: XPS depth profile analysis of non-stoichiometric NiO films. Surf Interface Anal 2004, 36:17–22.CrossRef 15. Tanaka S, Taniguchi M, Tanigawa H: XPS and UPS studies on electronic structure of Li 2 O. Nucl J Mater 2000, 283–287:1405–1408.CrossRef 16. Dedryvère R, Laruelle S, Grugeon S, Poizot P, Gonbeau D, Tarascon JM: Contribution of X-ray photoelectron spectroscopy to the study of the electrochemical reactivity of CoO toward lithium. Chem Mater 2004, 16:1056–1061.CrossRef 17. Wu QH, Thissen A, Jaegermann W: Photoelectron spectroscopic study of Li oxides on Li over-deposited V 2 O 5 thin film surfaces. Appl Surf Sci 2005, 250:57–62.CrossRef 18. Lu YM, Hwang WS, Yang JS: Effect of substrate temperature on the resistivity of non-stoichiometric sputtered NiO x films. Surf Coat Technol 2002, 155:231–235.